Chin. J. Semicond. > 1989, Volume 10 > Issue 7 > 483-488

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RF溅射碳化硅薄膜的结构研究

王英华 , 汤海鹏 , 田民波 and 李恒德

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    Received: 19 August 2015 Revised: Online: Published: 01 July 1989

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      Article Navigation >  Journal of Semiconductors  > 1989  >  10(7): 483-488
      王英华, 汤海鹏, 田民波, 李恒德. RF溅射碳化硅薄膜的结构研究[J]. 半导体学报(英文版), 1989, 10(7): 483-488.
      Citation:
      王英华, 汤海鹏, 田民波, 李恒德. RF溅射碳化硅薄膜的结构研究[J]. 半导体学报(英文版), 1989, 10(7): 483-488.
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      • Received Date: 2015-08-19

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