Chin. J. Semicond. > 2005, Volume 26 > Issue 8 > 1549-1552
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铸造多晶硅中铁的磷吸杂和氢钝化机理

陈金学 , 席珍强 , 吴冬冬 and 杨德仁

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Key words: 铸造多晶硅, 铁, 磷吸杂, 氢钝化

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    Received: 18 August 2015 Revised: Online: Published: 01 August 2005

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      Article Navigation >  Journal of Semiconductors  > 2005  >  26(8): 1549-1552
      陈金学, 席珍强, 吴冬冬, 杨德仁. 铸造多晶硅中铁的磷吸杂和氢钝化机理[J]. 半导体学报(英文版), 2005, 26(8): 1549-1552.
      Citation:
      陈金学, 席珍强, 吴冬冬, 杨德仁. 铸造多晶硅中铁的磷吸杂和氢钝化机理[J]. 半导体学报(英文版), 2005, 26(8): 1549-1552.
      shu

      • Received Date: 2015-08-18

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