Chin. J. Semicond. > 2001, Volume 22 > Issue 5 > 587-593
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等离子体化学气相沉积非晶SiO_x∶H(0≤x≤2.0)薄膜的红外光谱

何乐年

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Key words: PECVD, 非晶氧化硅薄膜, 红外吸收光谱, Si—O—Si键

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    Received: 20 August 2015 Revised: Online: Published: 01 May 2001

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      Article Navigation >  Journal of Semiconductors  > 2001  >  22(5): 587-593
      何乐年. 等离子体化学气相沉积非晶SiO_x∶H(0≤x≤2.0)薄膜的红外光谱[J]. 半导体学报(英文版), 2001, 22(5): 587-593.
      Citation:
      何乐年. 等离子体化学气相沉积非晶SiO_x∶H(0≤x≤2.0)薄膜的红外光谱[J]. 半导体学报(英文版), 2001, 22(5): 587-593.
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      • Received Date: 2015-08-20

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