Chin. J. Semicond. > 1996, Volume 17 > Issue 4 > 265-268
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Co／Si和Co／SiO_2界面反应的观察

张灶利，翟启华，纪箴，肖治纲，杜国维

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    Received: 18 August 2015 Revised: Online: Published: 01 April 1996

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      Article Navigation >  Journal of Semiconductors  > 1996  >  17(4): 265-268
      张灶利，翟启华，纪箴，肖治纲，杜国维. Co／Si和Co／SiO_2界面反应的观察[J]. 半导体学报(英文版), 1996, 17(4): 265-268.
      Citation:
      张灶利，翟启华，纪箴，肖治纲，杜国维. Co／Si和Co／SiO_2界面反应的观察[J]. 半导体学报(英文版), 1996, 17(4): 265-268.
      shu

      • Received Date: 2015-08-18

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