Chin. J. Semicond. > 2002, Volume 23 > Issue 2 > 208-212
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HF/CrO_3溶液对AlGaAs的选择性湿法刻蚀应用于楔型结构的制备

黄辉 , 黄永清 , 任晓敏 , 高俊华 , 罗丽萍 and 马骁宇

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Key words: 动态掩膜腐蚀, 选择性, 化学湿法腐蚀, 楔形结构

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    Received: 19 August 2015 Revised: Online: Published: 01 February 2002

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      Article Navigation >  Journal of Semiconductors  > 2002  >  23(2): 208-212
      黄辉, 黄永清, 任晓敏, 高俊华, 罗丽萍, 马骁宇. HF/CrO_3溶液对AlGaAs的选择性湿法刻蚀应用于楔型结构的制备[J]. 半导体学报(英文版), 2002, 23(2): 208-212.
      Citation:
      黄辉, 黄永清, 任晓敏, 高俊华, 罗丽萍, 马骁宇. HF/CrO_3溶液对AlGaAs的选择性湿法刻蚀应用于楔型结构的制备[J]. 半导体学报(英文版), 2002, 23(2): 208-212.
      shu

      • Received Date: 2015-08-19

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