Chin. J. Semicond. > 1980, Volume 1 > Issue 3 > 173-178

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硅中杂质能级的理论计算

陆栋 and 陆奋

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    Received: 20 August 2015 Revised: Online: Published: 01 March 1980

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      Article Navigation >  Journal of Semiconductors  > 1980  >  1(3): 173-178
      陆栋, 陆奋. 硅中杂质能级的理论计算[J]. 半导体学报(英文版), 1980, 1(3): 173-178.
      Citation:
      陆栋, 陆奋. 硅中杂质能级的理论计算[J]. 半导体学报(英文版), 1980, 1(3): 173-178.
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      • Received Date: 2015-08-20

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