Chin. J. Semicond. > 2005, Volume 26 > Issue 5 > 857-861

A Novel Local-Dielectric-Thickening Technique for Performance Improvements of Spiral Inductors on Si Substrates

Yang , Rong，Li , Junfeng，Zhao , Yuyin，Chai , Shumin，Han , Zhengsheng，and , Qian and He

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Key words: silicon, inductor, structure, process, quality factor, self-resonant frequency

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Received: 19 August 2015 Revised: Online: Published: 01 May 2005

Article Navigation > Journal of Semiconductors > 2005 > 26(5): 857-861

Yang, Rong，Li, Junfeng，Zhao, Yuyin，Chai, Shumin，Han, Zhengsheng，and, Qian, He. A Novel Local-Dielectric-Thickening Technique for Performance Improvements of Spiral Inductors on Si Substrates[J]. 半导体学报(英文版), 2005, 26(5): 857-861.

Citation:

Yang, Rong，Li, Junfeng，Zhao, Yuyin，Chai, Shumin，Han, Zhengsheng，and, Qian, He. A Novel Local-Dielectric-Thickening Technique for Performance Improvements of Spiral Inductors on Si Substrates[J]. 半导体学报(英文版), 2005, 26(5): 857-861.

Yang, Rong，Li, Junfeng，Zhao, Yuyin，Chai, Shumin，Han, Zhengsheng，and, Qian, He. A Novel Local-Dielectric-Thickening Technique for Performance Improvements of Spiral Inductors on Si Substrates[J]. 半导体学报(英文版), 2005, 26(5): 857-861.

Citation:

Yang, Rong，Li, Junfeng，Zhao, Yuyin，Chai, Shumin，Han, Zhengsheng，and, Qian, He. A Novel Local-Dielectric-Thickening Technique for Performance Improvements of Spiral Inductors on Si Substrates[J]. 半导体学报(英文版), 2005, 26(5): 857-861.

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