Chin. J. Semicond. > 2000, Volume 21 > Issue 4 > 404-408
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聚焦离子束辅助淀积的淀积速率模型

常旭 and 宗祥福

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Key words: 淀积速率, 模型, 聚焦离子束

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    Received: 20 August 2015 Revised: Online: Published: 01 April 2000

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      Article Navigation >  Journal of Semiconductors  > 2000  >  21(4): 404-408
      常旭, 宗祥福. 聚焦离子束辅助淀积的淀积速率模型[J]. 半导体学报(英文版), 2000, 21(4): 404-408.
      Citation:
      常旭, 宗祥福. 聚焦离子束辅助淀积的淀积速率模型[J]. 半导体学报(英文版), 2000, 21(4): 404-408.
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      • Received Date: 2015-08-20

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