Chin. J. Semicond. > 2000, Volume 21 > Issue 10 > 1019-1023
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ECR等离子体对单晶硅的低温大面积表面处理

孙剑 , 吴嘉达 , 钟晓霞 , 来冰 , 丁训民 and 李富铭

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Key words: 硅, 表面处理, ECR等离子体

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    Received: 20 August 2015 Revised: Online: Published: 01 October 2000

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      Article Navigation >  Journal of Semiconductors  > 2000  >  21(10): 1019-1023
      孙剑, 吴嘉达, 钟晓霞, 来冰, 丁训民, 李富铭. ECR等离子体对单晶硅的低温大面积表面处理[J]. 半导体学报(英文版), 2000, 21(10): 1019-1023.
      Citation:
      孙剑, 吴嘉达, 钟晓霞, 来冰, 丁训民, 李富铭. ECR等离子体对单晶硅的低温大面积表面处理[J]. 半导体学报(英文版), 2000, 21(10): 1019-1023.
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      • Received Date: 2015-08-20

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