Chin. J. Semicond. > 1982, Volume 3 > Issue 4 > 282-289
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氢气和氩气中区熔生长的中子嬗变掺杂硅退火行为的研究

王正元 and 林兰英

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    Received: 20 August 2015 Revised: Online: Published: 01 April 1982

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      Article Navigation >  Journal of Semiconductors  > 1982  >  3(4): 282-289
      王正元, 林兰英. 氢气和氩气中区熔生长的中子嬗变掺杂硅退火行为的研究[J]. 半导体学报(英文版), 1982, 3(4): 282-289.
      Citation:
      王正元, 林兰英. 氢气和氩气中区熔生长的中子嬗变掺杂硅退火行为的研究[J]. 半导体学报(英文版), 1982, 3(4): 282-289.
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      • Received Date: 2015-08-20

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