Chin. J. Semicond. > 1980, Volume 1 > Issue 3 > 192-197
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铒离子注入的硫化锌的退火研究

虞家琪 and F.J.Bryant

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    虞家琪, F.J.Bryant. 铒离子注入的硫化锌的退火研究[J]. 半导体学报(英文版), 1980, 1(3): 192-197.
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    Received: 20 August 2015 Revised: Online: Published: 01 March 1980

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      Article Navigation >  Journal of Semiconductors  > 1980  >  1(3): 192-197
      虞家琪, F.J.Bryant. 铒离子注入的硫化锌的退火研究[J]. 半导体学报(英文版), 1980, 1(3): 192-197.
      Citation:
      虞家琪, F.J.Bryant. 铒离子注入的硫化锌的退火研究[J]. 半导体学报(英文版), 1980, 1(3): 192-197.
      shu

      • Received Date: 2015-08-20

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