Chin. J. Semicond. > 2004, Volume 25 > Issue 6 > 639-644
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单晶纳米硅薄膜的制备及其场发射特性(英文)

王伟明 , 郁可 , 丁艳芳 , 李琼 and 朱自强

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Key words: 单晶纳米硅, 阳极腐蚀, 晶向一致, 场发射

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    Received: 19 August 2015 Revised: Online: Published: 01 June 2004

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      Article Navigation >  Journal of Semiconductors  > 2004  >  25(6): 639-644
      王伟明, 郁可, 丁艳芳, 李琼, 朱自强. 单晶纳米硅薄膜的制备及其场发射特性(英文)[J]. 半导体学报(英文版), 2004, 25(6): 639-644.
      Citation:
      王伟明, 郁可, 丁艳芳, 李琼, 朱自强. 单晶纳米硅薄膜的制备及其场发射特性(英文)[J]. 半导体学报(英文版), 2004, 25(6): 639-644.
      shu

      • Received Date: 2015-08-19

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