Chin. J. Semicond. > 2004, Volume 25 > Issue 11 > 1458-1463
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聚焦离子束诱发金属有机化学气相淀积碳-铂薄膜

江素华 , 唐凌 and 王家楫

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Key words: 聚焦离子束, 金属有机化学气相淀积, 薄膜, 铂, 碳

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    Received: 19 August 2015 Revised: Online: Published: 01 November 2004

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      Article Navigation >  Journal of Semiconductors  > 2004  >  25(11): 1458-1463
      江素华, 唐凌, 王家楫. 聚焦离子束诱发金属有机化学气相淀积碳-铂薄膜[J]. 半导体学报(英文版), 2004, 25(11): 1458-1463.
      Citation:
      江素华, 唐凌, 王家楫. 聚焦离子束诱发金属有机化学气相淀积碳-铂薄膜[J]. 半导体学报(英文版), 2004, 25(11): 1458-1463.
      shu

      • Received Date: 2015-08-19

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