Chin. J. Semicond. > 1991, Volume 12 > Issue 5 > 294-299

PDF

  • Search

    Advanced Search >>

    GET CITATION

    shu

    Export: BibTex EndNote

    Article Metrics

    Article views: 2035 Times PDF downloads: 913 Times Cited by: 0 Times

    History

    Received: 19 August 2015 Revised: Online: Published: 01 May 1991

    Catalog

      Email This Article

      User name:
      Email:*请输入正确邮箱
      Code:*验证码错误
      冯嘉猷, 汤海鹏, 朱洪林, 范玉殿, 李恒德. 离化团束方法在GaAs衬底上外延CdTe单晶薄膜[J]. 半导体学报(英文版), 1991, 12(5): 294-299.
      Citation:
      冯嘉猷, 汤海鹏, 朱洪林, 范玉殿, 李恒德. 离化团束方法在GaAs衬底上外延CdTe单晶薄膜[J]. 半导体学报(英文版), 1991, 12(5): 294-299.

      • Received Date: 2015-08-19

      Catalog

        /

        DownLoad:  Full-Size Img  PowerPoint
        Return
        Return