Chin. J. Semicond. > 1998, Volume 19 > Issue 8 > 565-568
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UHV/CVD低温生长硅外延层的性能研究

叶志镇 , 曹青 , 张侃 , 陈伟华 , 汪雷 , 李先杭 , 赵炳辉 , 李剑光 and 卢焕明

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    Received: 18 August 2015 Revised: Online: Published: 01 August 1998

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      Article Navigation >  Journal of Semiconductors  > 1998  >  19(8): 565-568
      叶志镇, 曹青, 张侃, 陈伟华, 汪雷, 李先杭, 赵炳辉, 李剑光, 卢焕明. UHV/CVD低温生长硅外延层的性能研究[J]. 半导体学报(英文版), 1998, 19(8): 565-568.
      Citation:
      叶志镇, 曹青, 张侃, 陈伟华, 汪雷, 李先杭, 赵炳辉, 李剑光, 卢焕明. UHV/CVD低温生长硅外延层的性能研究[J]. 半导体学报(英文版), 1998, 19(8): 565-568.
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      • Received Date: 2015-08-18

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