Chin. J. Semicond. > 2003, Volume 24 > Issue 10 > 1030-1034
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0.18μm CMOS工艺条件下的信号完整性分析(英文)

孙加兴 , 叶青 , 周玉梅 and 叶甜春

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Key words: 互连线延迟, 信号完整性, 串扰, 噪声

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    Received: 20 August 2015 Revised: Online: Published: 01 October 2003

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      Article Navigation >  Journal of Semiconductors  > 2003  >  24(10): 1030-1034
      孙加兴, 叶青, 周玉梅, 叶甜春. 0.18μm CMOS工艺条件下的信号完整性分析(英文)[J]. 半导体学报(英文版), 2003, 24(10): 1030-1034.
      Citation:
      孙加兴, 叶青, 周玉梅, 叶甜春. 0.18μm CMOS工艺条件下的信号完整性分析(英文)[J]. 半导体学报(英文版), 2003, 24(10): 1030-1034.
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      • Received Date: 2015-08-20

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