Chin. J. Semicond. > 2004, Volume 25 > Issue 1 > 99-103
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利用(110)硅片制作体硅微光开关的工艺研究

张龙 , 董玮 , 张歆东 , 刘彩霞 , 陈维友 and 徐宝琨

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Key words: 微反射镜, {111}面, 湿法腐蚀, 粗糙度, 氢氧化钾溶液

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    Received: 19 August 2015 Revised: Online: Published: 01 January 2004

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      Article Navigation >  Journal of Semiconductors  > 2004  >  25(1): 99-103
      张龙, 董玮, 张歆东, 刘彩霞, 陈维友, 徐宝琨. 利用(110)硅片制作体硅微光开关的工艺研究[J]. 半导体学报(英文版), 2004, 25(1): 99-103.
      Citation:
      张龙, 董玮, 张歆东, 刘彩霞, 陈维友, 徐宝琨. 利用(110)硅片制作体硅微光开关的工艺研究[J]. 半导体学报(英文版), 2004, 25(1): 99-103.
      shu

      • Received Date: 2015-08-19

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