Chin. J. Semicond. > 2003, Volume 24 > Issue 2 > 177-182
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LP-MOCVD生长ZnO薄膜的氧源

陈童 , 顾书林 , 叶建东 , 朱顺明 , 秦锋 , 胡立群 , 张荣 , 施毅 and 郑有炓

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Key words: ZnO薄膜, LP-MOCVD, 离化

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    Received: 20 August 2015 Revised: Online: Published: 01 February 2003

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      Article Navigation >  Journal of Semiconductors  > 2003  >  24(2): 177-182
      陈童, 顾书林, 叶建东, 朱顺明, 秦锋, 胡立群, 张荣, 施毅, 郑有炓. LP-MOCVD生长ZnO薄膜的氧源[J]. 半导体学报(英文版), 2003, 24(2): 177-182.
      Citation:
      陈童, 顾书林, 叶建东, 朱顺明, 秦锋, 胡立群, 张荣, 施毅, 郑有炓. LP-MOCVD生长ZnO薄膜的氧源[J]. 半导体学报(英文版), 2003, 24(2): 177-182.
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      • Received Date: 2015-08-20

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