Chin. J. Semicond. > 2002, Volume 23 > Issue 11 > 1173-1177
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Meirhaeghe Ni/Pd/Si固相反应及NiSi热稳定性增强研究

屈新萍 , 茹国平 , 李炳宗 , C Detavernier and R Van

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Key words: NiSi, 成核, 固熔体, 热稳定性

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    Received: 19 August 2015 Revised: Online: Published: 01 November 2002

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      Article Navigation >  Journal of Semiconductors  > 2002  >  23(11): 1173-1177
      屈新萍, 茹国平, 李炳宗, C Detavernier, R Van. Meirhaeghe Ni/Pd/Si固相反应及NiSi热稳定性增强研究[J]. 半导体学报(英文版), 2002, 23(11): 1173-1177.
      Citation:
      屈新萍, 茹国平, 李炳宗, C Detavernier, R Van. Meirhaeghe Ni/Pd/Si固相反应及NiSi热稳定性增强研究[J]. 半导体学报(英文版), 2002, 23(11): 1173-1177.
      shu

      • Received Date: 2015-08-19

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