Chin. J. Semicond. > 1998, Volume 19 > Issue 6 > 452-457
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VLSI金属化布线电徙动动力学温度相关性研究

李志国 , 郭伟玲 , 朱红 , 吉元 , 程尧海 , 孙英华 and 张万荣

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    Received: 18 August 2015 Revised: Online: Published: 01 June 1998

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      Article Navigation >  Journal of Semiconductors  > 1998  >  19(6): 452-457
      李志国, 郭伟玲, 朱红, 吉元, 程尧海, 孙英华, 张万荣. VLSI金属化布线电徙动动力学温度相关性研究[J]. 半导体学报(英文版), 1998, 19(6): 452-457.
      Citation:
      李志国, 郭伟玲, 朱红, 吉元, 程尧海, 孙英华, 张万荣. VLSI金属化布线电徙动动力学温度相关性研究[J]. 半导体学报(英文版), 1998, 19(6): 452-457.
      shu

      • Received Date: 2015-08-18

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