Citation: |
Zeng Yugang, Han Genquan, Yu Jinzhong. Smaller Ge Quantum Dots Obtained by ArF Excimer Laser Annealing[J]. Journal of Semiconductors, 2008, 29(4): 641-644.
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Zeng Y G, Han G Q, Yu J Z. Smaller Ge Quantum Dots Obtained by ArF Excimer Laser Annealing[J]. J. Semicond., 2008, 29(4): 641.
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Smaller Ge Quantum Dots Obtained by ArF Excimer Laser Annealing
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Abstract
Ge self-assembled quantum dots (SAQDs) are grown with a self-assembled UHV/CVD epitaxy system.Then,the as-grown Ge quantum dots are annealed by ArF excimer laser.In the ultra-shot laser pulse duration,~20ns,bulk diffusion is forbidden,and only surface diffusion occurs,resulting in a laser induced quantum dot (LIQD).The diameter of the LIQD is 20~25nm which is much smaller than the as-grown dot and the LIQD has a higher density of about 6E10cm-2.The surface morphology evolution is investigated by AFM.-
Keywords:
- Ge quantum dot,
- ArF excimer laser annealing,
- LIQD,
- AFM
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References
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Proportional views