Chin. J. Semicond. > 1980, Volume 1 > Issue 3 > 251-253
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激光退火对硅氧化层错的抑制作用

鲍希茂 , 嵇福权 , 黄信凡 and 陈南斗

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    Received: 20 August 2015 Revised: Online: Published: 01 March 1980

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      Article Navigation >  Journal of Semiconductors  > 1980  >  1(3): 251-253
      鲍希茂, 嵇福权, 黄信凡, 陈南斗. 激光退火对硅氧化层错的抑制作用[J]. 半导体学报(英文版), 1980, 1(3): 251-253.
      Citation:
      鲍希茂, 嵇福权, 黄信凡, 陈南斗. 激光退火对硅氧化层错的抑制作用[J]. 半导体学报(英文版), 1980, 1(3): 251-253.
      shu

      • Received Date: 2015-08-20

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