Chin. J. Semicond. > 2002, Volume 23 > Issue 10 > 1116-1120

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响应表面法在工艺综合中的应用

鲁勇 , 张文俊 and 杨之廉

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Key words: 响应表面法, 多分区响应表面法, 工艺综合, MOSPAD, 工艺窗口

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    Received: 19 August 2015 Revised: Online: Published: 01 October 2002

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      Article Navigation >  Journal of Semiconductors  > 2002  >  23(10): 1116-1120
      鲁勇, 张文俊, 杨之廉. 响应表面法在工艺综合中的应用[J]. 半导体学报(英文版), 2002, 23(10): 1116-1120.
      Citation:
      鲁勇, 张文俊, 杨之廉. 响应表面法在工艺综合中的应用[J]. 半导体学报(英文版), 2002, 23(10): 1116-1120.
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      • Received Date: 2015-08-19

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