Chin. J. Semicond. > 2001, Volume 22 > Issue 5 > 565-568
|

CONTENTS

新型亚50纳米硅栅制作技术(英文)

张盛东 , 韩汝琦 , 刘晓彦 , 关旭东 , 李婷 and 张大成

+ Author Affiliations

PDF

Key words: 硅栅, 亚50nm, 图形转移, 光刻

    • Search

    Advanced Search >>

    GET CITATION

    shu

    Export: BibTex EndNote

    Article Metrics

    Article views: 2353 Times PDF downloads: 855 Times Cited by: 0 Times

    History

    Received: 20 August 2015 Revised: Online: Published: 01 May 2001

    Catalog

      Email This Article

      User name:
      Email:*请输入正确邮箱
      Code:*验证码错误
      Send
      Article Navigation >  Journal of Semiconductors  > 2001  >  22(5): 565-568
      张盛东, 韩汝琦, 刘晓彦, 关旭东, 李婷, 张大成. 新型亚50纳米硅栅制作技术(英文)[J]. 半导体学报(英文版), 2001, 22(5): 565-568.
      Citation:
      张盛东, 韩汝琦, 刘晓彦, 关旭东, 李婷, 张大成. 新型亚50纳米硅栅制作技术(英文)[J]. 半导体学报(英文版), 2001, 22(5): 565-568.
      shu

      • Received Date: 2015-08-20

      Catalog

        Journal of Semiconductors © 2017 All Rights Reserved   京ICP备05085259号-2

        /

        DownLoad:  Full-Size Img  PowerPoint
        Return
        Return