Chin. J. Semicond. > 2000, Volume 21 > Issue 1 > 22-27

Application of Wet Chemical Etching in Fabrication Process of GaAs/AlGaAs Quantum Dot Arrays

王杏华 , 宋爱民 , 程文超 , 李国华 , 李承芳 , 李月霞 and 谭平恒

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Received: 20 August 2015 Revised: Online: Published: 01 January 2000

Article Navigation > Journal of Semiconductors > 2000 > 21(1): 22-27

王杏华, 宋爱民, 程文超, 李国华, 李承芳, 李月霞, 谭平恒. Application of Wet Chemical Etching in Fabrication Process of GaAs/AlGaAs Quantum Dot Arrays[J]. 半导体学报(英文版), 2000, 21(1): 22-27.

Citation:

王杏华, 宋爱民, 程文超, 李国华, 李承芳, 李月霞, 谭平恒. Application of Wet Chemical Etching in Fabrication Process of GaAs/AlGaAs Quantum Dot Arrays[J]. 半导体学报(英文版), 2000, 21(1): 22-27.

王杏华, 宋爱民, 程文超, 李国华, 李承芳, 李月霞, 谭平恒. Application of Wet Chemical Etching in Fabrication Process of GaAs/AlGaAs Quantum Dot Arrays[J]. 半导体学报(英文版), 2000, 21(1): 22-27.

Citation:

王杏华, 宋爱民, 程文超, 李国华, 李承芳, 李月霞, 谭平恒. Application of Wet Chemical Etching in Fabrication Process of GaAs/AlGaAs Quantum Dot Arrays[J]. 半导体学报(英文版), 2000, 21(1): 22-27.

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