Chin. J. Semicond. > 2005, Volume 26 > Issue 5 > 947-951
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(100)定向CVD金刚石薄膜的制备及其电学性能

苏青峰 , 夏义本 , 王林军 , 张明龙 , 楼燕燕 , 顾蓓蓓 and 史伟民

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Key words: 金刚石薄膜, HFCVD, (100)定向生长, 电学特性

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    Received: 19 August 2015 Revised: Online: Published: 01 May 2005

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      Article Navigation >  Journal of Semiconductors  > 2005  >  26(5): 947-951
      苏青峰, 夏义本, 王林军, 张明龙, 楼燕燕, 顾蓓蓓, 史伟民. (100)定向CVD金刚石薄膜的制备及其电学性能[J]. 半导体学报(英文版), 2005, 26(5): 947-951.
      Citation:
      苏青峰, 夏义本, 王林军, 张明龙, 楼燕燕, 顾蓓蓓, 史伟民. (100)定向CVD金刚石薄膜的制备及其电学性能[J]. 半导体学报(英文版), 2005, 26(5): 947-951.
      shu

      • Received Date: 2015-08-19

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