H Y Yu, J F Kang, Ren Chi, M F Li, D L Kwong. HfO_2 Gate Dielectrics for Future Generation of CMOS Device Application[J]. 半导体学报(英文版), 2004, 25(10): 1193-1204.
Citation:
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H Y Yu, J F Kang, Ren Chi, M F Li, D L Kwong. HfO_2 Gate Dielectrics for Future Generation of CMOS Device Application[J]. 半导体学报(英文版), 2004, 25(10): 1193-1204.
|
H Y Yu, J F Kang, Ren Chi, M F Li, D L Kwong. HfO_2 Gate Dielectrics for Future Generation of CMOS Device Application[J]. 半导体学报(英文版), 2004, 25(10): 1193-1204.
Citation:
|
H Y Yu, J F Kang, Ren Chi, M F Li, D L Kwong. HfO_2 Gate Dielectrics for Future Generation of CMOS Device Application[J]. 半导体学报(英文版), 2004, 25(10): 1193-1204.
|