Chin. J. Semicond. > 2000, Volume 21 > Issue 3 > 308-312

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掺杂nc-Si∶H膜的电导特性

彭英才 , 刘明 , 何宇亮 and 李月霞

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Key words: 电导特性, nc-Si∶H膜

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    Received: 20 August 2015 Revised: Online: Published: 01 March 2000

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      Article Navigation >  Journal of Semiconductors  > 2000  >  21(3): 308-312
      彭英才, 刘明, 何宇亮, 李月霞. 掺杂nc-Si∶H膜的电导特性[J]. 半导体学报(英文版), 2000, 21(3): 308-312.
      Citation:
      彭英才, 刘明, 何宇亮, 李月霞. 掺杂nc-Si∶H膜的电导特性[J]. 半导体学报(英文版), 2000, 21(3): 308-312.
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      • Received Date: 2015-08-20

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