Chin. J. Semicond. > 2005, Volume 26 > Issue 9 > 1692-1698

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Key words: integrated photosensitivity multilayer structureNEA photocathodediffusion lengthsurface escape probability

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    Received: 18 August 2015 Revised: Online: Published: 01 September 2005

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      Wang Xiaofeng, Zeng Yiping, Wang Baoqiang, Zhu Zhanping, Du Xiaoqing, Li Min, and Chang Benkang. High-Integrated-Photosensitivity Negative-Electron-Affinity GaAs Photocathodes with Multilayer Be-Doping Structures[J]. Journal of Semiconductors, 2005, 26(9): 1692-1698. ****W X feng, Z Y ping, W B qiang, Z Z ping, D X qing, L Min, and Chang Benkang and C B kang. High-Integrated-Photosensitivity Negative-Electron-Affinity GaAs Photocathodes with Multilayer Be-Doping Structures[J]. Chin. J. Semicond., 2005, 26(9): 1692.
      Citation:
      Wang Xiaofeng, Zeng Yiping, Wang Baoqiang, Zhu Zhanping, Du Xiaoqing, Li Min, and Chang Benkang. High-Integrated-Photosensitivity Negative-Electron-Affinity GaAs Photocathodes with Multilayer Be-Doping Structures[J]. Journal of Semiconductors, 2005, 26(9): 1692-1698. ****
      W X feng, Z Y ping, W B qiang, Z Z ping, D X qing, L Min, and Chang Benkang and C B kang. High-Integrated-Photosensitivity Negative-Electron-Affinity GaAs Photocathodes with Multilayer Be-Doping Structures[J]. Chin. J. Semicond., 2005, 26(9): 1692.

      High-Integrated-Photosensitivity Negative-Electron-Affinity GaAs Photocathodes with Multilayer Be-Doping Structures

      • Received Date: 2015-08-18

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