Chin. J. Semicond. > 1991, Volume 12 > Issue 12 > 743-748
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Pd/W/Si(111)多层膜形成硅化物的研究

施一生 , 赵特秀 , 刘洪图 and 王晓平

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    Received: 19 August 2015 Revised: Online: Published: 01 December 1991

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      Article Navigation >  Journal of Semiconductors  > 1991  >  12(12): 743-748
      施一生, 赵特秀, 刘洪图, 王晓平. Pd/W/Si(111)多层膜形成硅化物的研究[J]. 半导体学报(英文版), 1991, 12(12): 743-748.
      Citation:
      施一生, 赵特秀, 刘洪图, 王晓平. Pd/W/Si(111)多层膜形成硅化物的研究[J]. 半导体学报(英文版), 1991, 12(12): 743-748.
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      • Received Date: 2015-08-19

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