Chin. J. Semicond. > 1985, Volume 6 > Issue 5 > 511-517
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H_2O在Si(100)-(2×1)表面上的吸附和氧化

邢益荣 and W.Ranke

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    Received: 20 August 2015 Revised: Online: Published: 01 May 1985

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      Article Navigation >  Journal of Semiconductors  > 1985  >  6(5): 511-517
      邢益荣, W.Ranke. H_2O在Si(100)-(2×1)表面上的吸附和氧化[J]. 半导体学报(英文版), 1985, 6(5): 511-517.
      Citation:
      邢益荣, W.Ranke. H_2O在Si(100)-(2×1)表面上的吸附和氧化[J]. 半导体学报(英文版), 1985, 6(5): 511-517.
      shu

      • Received Date: 2015-08-20

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