Chin. J. Semicond. > 1991, Volume 12 > Issue 12 > 749-754
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TiSi_2/n~+poly-Si复合结构热处理对磷再分布及RIE的影响

徐秋霞 , 周锁京 and 赵玉印

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    Received: 19 August 2015 Revised: Online: Published: 01 December 1991

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      Article Navigation >  Journal of Semiconductors  > 1991  >  12(12): 749-754
      徐秋霞, 周锁京, 赵玉印. TiSi_2/n~+poly-Si复合结构热处理对磷再分布及RIE的影响[J]. 半导体学报(英文版), 1991, 12(12): 749-754.
      Citation:
      徐秋霞, 周锁京, 赵玉印. TiSi_2/n~+poly-Si复合结构热处理对磷再分布及RIE的影响[J]. 半导体学报(英文版), 1991, 12(12): 749-754.
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      • Received Date: 2015-08-19

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