Chin. J. Semicond. > 1989, Volume 10 > Issue 10 > 763-768
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晶体硅中氢钝化硼的机理

施天生 and 钟钦

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    Received: 19 August 2015 Revised: Online: Published: 01 October 1989

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      Article Navigation >  Journal of Semiconductors  > 1989  >  10(10): 763-768
      施天生, 钟钦. 晶体硅中氢钝化硼的机理[J]. 半导体学报(英文版), 1989, 10(10): 763-768.
      Citation:
      施天生, 钟钦. 晶体硅中氢钝化硼的机理[J]. 半导体学报(英文版), 1989, 10(10): 763-768.
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      • Received Date: 2015-08-19

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