Chin. J. Semicond. > Volume 2 > Issue 4 > Article Number: 263

用场效应方法研究a-Si中定域态密度

杨喜荣 , 廖显伯 , 孔光临 and 刘昌灵

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Abstract: 用场效应方法研究了未掺杂GD-a-Si薄膜中的定域态密度分布N_((E)),比较了不同淀积条件和退火温度对N_((E))的影响.

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History

Manuscript received: 20 August 2015 Manuscript revised: Online: Published: 01 April 1981

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