Chin. J. Semicond. > Volume 13 > Issue 11 > Article Number: 690

单晶外延层厚度的X射线双晶衍射测定

朱南昌 , 李润身 , 陈京一 and 许顺生

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Abstract: 本文在利用X射线动力学和运动学衍射理论对单晶外延层材料的双晶摇摆曲线进行计算分析的基础上,给出了测定单晶外延层厚度和质量的方法.当外延层的厚度较薄时,外延层衍射峰的衍射强度正比于厚度的平方,半峰宽反比于厚度.当厚度较厚时,衍射峰的强度增加逐渐趋于饱和,而半峰宽趋于材料的本征半峰宽.外延层的干涉小峰间距反比于外延层的厚度.通过测量样品的双晶摇摆曲线上干涉峰间距,峰强比和半峰宽可以求得外延层的厚度,并对外延层的质量做出评价.

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History

Manuscript received: 19 August 2015 Manuscript revised: Online: Published: 01 November 1992

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