Abstract: 利用低温(8K)远红外吸收技术,研究了硅单晶中氮杂质对热施主及浅热施主形成的影响,指出氮原子有抑制硅中热施主形成的能力,而微氮硅中的浅热施主和氧-氮复合体直接相关。
Article views: 1636 Times PDF downloads: 770 Times Cited by: 0 Times
Manuscript received: 19 August 2015 Manuscript revised: Online: Published: 01 August 1995
Journal of Semiconductors © 2017 All Rights Reserved 京ICP备05085259号-2