Chin. J. Semicond. > Volume 14 > Issue 11 > Article Number: 712

蓝宝石上硅膜(SOS)肖特基结注入电流检测的电子自旋共振及Si/Al_2O_3界面缺陷

傅济时 , 吴恩 , 秦国刚 , 朱美栋 and 郁元桓

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Abstract: 我们用高灵敏的肖特基结注入电流检测磁共振方法对蓝宝石上外延硅膜进行了研究。实验观察到一各向同性非对称的磁共振谱,经拟合它由线宽10~(-3)T,g值分别为2.0055及2.012的二线组合而成,二线强度比3.7:1。前者是硅悬挂键,后者为非晶硅价态尾态共振。实验证实该磁共振信号来自于Si/Al_2O_3界面。

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History

Manuscript received: 20 August 2015 Manuscript revised: Online: Published: 01 November 1993

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