Chin. J. Semicond. > Volume 13 > Issue 6 > Article Number: 372

TiO_2薄膜制备及其表面光电压谱研究

戴国瑞 , 刘旺 , 陈自力 , 姜月顺 , 诸真家 , 陈丽华 and 李铁津

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Abstract: 本文报道了采用PECVD技术淀积TiO_2薄膜,深入地研究了反应条件对薄膜生长的影响,并对薄膜进行了光电子能谱和表面光电压谱测试,结果表明,Ti/O原子比接近2,钛原子氧化态为4,高温氢气退火处理的样品,存在三价态钛Ti~(3+).TiO_2薄膜淀积在硅衬底上,在合适条件下,表面光电压信号增强约二个数量级,主要是形成异质结和消反射作用的结果.

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History

Manuscript received: 19 August 2015 Manuscript revised: Online: Published: 01 June 1992

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