Light and matter co-confined multi-photon lithography: an innovative way to break through the limits of traditional lithography

Jingyu Wang; Zhanfeng Guo; Zhu Wang; Zhengwei Liu; Daixuan Wu; He Tian

doi:10.1088/1674-4926/24110023

J. Semicond. > 2025, Volume 46 > Issue 3 > 030401

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Light and matter co-confined multi-photon lithography: an innovative way to break through the limits of traditional lithography

Jingyu Wang¹, Zhanfeng Guo¹, Zhu Wang², Zhengwei Liu², Daixuan Wu^1, and He Tian^1,

+ Author Affiliations

1. School of Integrated Circuits & Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing 100084, China
2. Jiangsu Fengbo Equipment Technology Co., Ltd, Wuxi 214000, China

Author Bio:

Jingyu Wang received her bachelor’s degree in 2024 from Jilin University. Her undergraduate major is Microelectronics Science and Engineering. Now she is a graduate student in the School of Integrated Circuit, Tsinghua University, under the supervision of Prof. He Tian.

Daixuan Wu, Ph.D. in Engineering from the University of Pennsylvania, previously served as the Chief Engineer at AVIC gyroscope (Xi'an) Optoelectronic Technology Co., Ltd, and is currently a researcher at School of Integrated Circuits, Tsinghua University. She holds positions as a Master's supervisor at Xi'an Jiaotong University and a Ph.D. supervisor at Xiamen University. She has long been engaged in the research of MEMS sensors and low-dimensional materials. Dr. Wu has participated in the design of over 40 different models, covering fields such as aviation, aerospace, weaponry, and naval engineering.

He Tian received his Ph.D. degree from the Institute of Microelectronics, Tsinghua University in 2015. He is currently a Tenured Associate Professor and Deputy Director at Institute of Integrated Electronics, School of Integrated Circuits, Tsinghua University. He is the recipient of the National High-level Leading Talents, National Outstanding Youth Foundation and Highly Cited Scholar in Web of Science 2024. His current research interest includes various 2D material-based devices with more than 250 publications and more than 10000 times citations.

Corresponding author: Daixuan Wu, dx-wu@tsinghua.edu.cn; He Tian, tianhe88@tsinghua.edu.cn

DOI: 10.1088/1674-4926/24110023CSTR: 32376.14.1674-4926.24110023

References

[1]	Guan L L, Cao C, Liu X, et al. Author correction: Light and matter co-confined multi-photon lithography. Nat Commun, 2024, 15, 3730 doi: 10.1038/s41467-024-48298-x
[2]	Hong M H. Acousto-optic scanning multi-photon lithography with high printing rate. Opto Electron Adv, 2024, 7, 240003 doi: 10.29026/oea.2024.240003
[3]	Wickberg A, Abass A, Hsiao H H, et al. Second-harmonic generation by 3D laminate metacrystals. Adv Opt Mater, 2019, 7, 1801235 doi: 10.1002/adom.201801235
[4]	Scott T F, Kowalski B A, Sullivan A C, et al. Two-color single-photon photoinitiation and photoinhibition for subdiffraction photolithography. Science, 2009, 324, 913 doi: 10.1126/science.1167610
[5]	Cao C, Qiu Y W, Guan L L, et al. Dip-In photoresist for photoinhibited two-photon lithography to realize high-precision direct laser writing on wafer. ACS Appl Mater Interfaces, 2022, 14, 31332 doi: 10.1021/acsami.2c08063
[6]	Cao C, Liu J T, Xia X M, et al. Click chemistry assisted organic-inorganic hybrid photoresist for ultra-fast two-photon lithography. Addit Manuf, 2022, 51, 102658 doi: 10.1016/j.addma.2022.102658
[7]	Debye P. Das verhalten von lichtwellen in der Nähe eines brennpunktes oder einer brennlinie. Ann Der Phys, 1909, 335, 755 doi: 10.1002/andp.19093351406
[8]	Rayleigh L. XII. On the manufacture and theory of diffraction-gratings. Lond Edinb Dublin Philos Mag J Sci, 1874, 47, 81 doi: 10.1080/14786447408640996

Fig. 1. (Color online) Schematic diagram of two-step-STED light confining mechanism for LMC-MPL (Energy level transitions include: 3hν three-photon absorption, IC internal conversion, VR vibrational relaxation and ISC inter-system crossing. Q: quencher, [Q]*: excited quencher, R*: free radical, Q–R: non-reactive adduct formed by free radicals and quencher)^[1].

DownLoad: Full-Size Img PowerPoint

Fig. 2. (Color online) Three-dimensional woodpile structure made by MPL, MC-MPL, and LMC-MPL. (a)–(c) are taken perpendicular to the x–y plane (scale bar: 300 nm), while (d)–(f) are taken with the x–y plane tilted 45° (scale bar: 1 μm). With d = 300 nm, the lines of woodpile structure obtained by MPL cannot be separated. Therefore, the period is expanded to d = 700 nm (inset of (d) image) for MPL^[1].

DownLoad: Full-Size Img PowerPoint

Fig. 3. (Color online) The original 3D model and fabricated SEM morphology of Nezha (40 μm in height) using Pr1 and Pr2. Scale bar: 10 μm. The hair lines of Nezha made by Pr2 are more clearly visible than that made by Pr1, which demonstrates that MC-MPL has a better ability to fabricate fine structures than MPL^[1].

DownLoad: Full-Size Img PowerPoint

[1]	Guan L L, Cao C, Liu X, et al. Author correction: Light and matter co-confined multi-photon lithography. Nat Commun, 2024, 15, 3730 doi: 10.1038/s41467-024-48298-x
[2]	Hong M H. Acousto-optic scanning multi-photon lithography with high printing rate. Opto Electron Adv, 2024, 7, 240003 doi: 10.29026/oea.2024.240003
[3]	Wickberg A, Abass A, Hsiao H H, et al. Second-harmonic generation by 3D laminate metacrystals. Adv Opt Mater, 2019, 7, 1801235 doi: 10.1002/adom.201801235
[4]	Scott T F, Kowalski B A, Sullivan A C, et al. Two-color single-photon photoinitiation and photoinhibition for subdiffraction photolithography. Science, 2009, 324, 913 doi: 10.1126/science.1167610
[5]	Cao C, Qiu Y W, Guan L L, et al. Dip-In photoresist for photoinhibited two-photon lithography to realize high-precision direct laser writing on wafer. ACS Appl Mater Interfaces, 2022, 14, 31332 doi: 10.1021/acsami.2c08063
[6]	Cao C, Liu J T, Xia X M, et al. Click chemistry assisted organic-inorganic hybrid photoresist for ultra-fast two-photon lithography. Addit Manuf, 2022, 51, 102658 doi: 10.1016/j.addma.2022.102658
[7]	Debye P. Das verhalten von lichtwellen in der Nähe eines brennpunktes oder einer brennlinie. Ann Der Phys, 1909, 335, 755 doi: 10.1002/andp.19093351406
[8]	Rayleigh L. XII. On the manufacture and theory of diffraction-gratings. Lond Edinb Dublin Philos Mag J Sci, 1874, 47, 81 doi: 10.1080/14786447408640996