Citation: |
Ping Cheng, Yuming Zhang, Yimen Zhang. First-principles calculation on the concentration of intrinsic defects in 4H-SiC[J]. Journal of Semiconductors, 2013, 34(1): 013002. doi: 10.1088/1674-4926/34/1/013002
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P Cheng, Y M Zhang, Y M Zhang. First-principles calculation on the concentration of intrinsic defects in 4H-SiC[J]. J. Semicond., 2013, 34(1): 013002. doi: 10.1088/1674-4926/34/1/013002.
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First-principles calculation on the concentration of intrinsic defects in 4H-SiC
DOI: 10.1088/1674-4926/34/1/013002
More Information
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Abstract
Based on the first-principles pseudopotentials and the plane wave energy band method, the supercells of perfect crystal 4H-SiC and those with intrinsic defects VC, VSi, VC-C and VC-Si were calculated. Ignoring the atomic relaxations, the results show that the formation energy of intrinsic defects is ranked, from low to high, as VC, VC-C, VSi to VSi-Si at 0 K. The equilibrium concentration of each intrinsic defect can be deduced from the formation energy of each intrinsic defect. The concentration ranks, from high to low, as VC, VC-C, VSi, VSi-Si, which is in accordance with the ESR and PL results. The stabilizing process of metastable defects VSi converting to VC-C was explained by formation energy.-
Keywords:
- first-principles,
- intrinsic defects,
- formation energy
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References
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