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J. Semicond. > 2014, Volume 35 > Issue 4 > 045003

SEMICONDUCTOR INTEGRATED CIRCUITS

An integrated power divider implemented in GaAs technology

Zebao Du, Hao Yang, Haiying Zhang and Min Zhu

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 Corresponding author: Du Zebao, Email:duzebao@ime.ac.cn

DOI: 10.1088/1674-4926/35/4/045003

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Abstract: A compact lumped integrated power divider with low insertion loss using 0.5 μm GaAs pHEMT technology is presented. The proposed power divider uses the π-type LC network for transmission line equivalence and a thin film resistor for isolation tuning simultaneously. The quality factor of the inductor is analyzed and synthesized for insertion-loss influence. The measured insertion loss is less than 0.5 dB when the operating frequency is within the range of 5.15-6.15 GHz. The return loss and isolation are better than 15 dB and 20 dB, respectively. The compact dimension of the power divider is as small as 0.9×0.85 mm2. The measured results agree well with the simulated ones.

Key words: power dividerGaAsIPD

The demand for high-integration, miniature wireless communication systems has boosted the interest in low-cost, high-performance integrated passive devices (IPDs) during the last few years. The semiconductor-based IPD grows as an attractive technology capable of realizing many types of passive components using a thick conductor on a low-loss substrate. The power divider with low insertion loss and compact size is one of the most important devices in communication systems[1, 2]. Owing to its advantages in size, cost and realizable system on chip, lumped-element power dividers have been widely designed and reported[3-9].

The lumped-element network has been chosen as the transmission-line counterpart to realize an integrated power divider. Four types of discrete lumped-element Wilkinson power dividers were proposed and tested[3]. The available relative bandwidth of the lumped power divider indicates its potential for IPD application. An active inductor was used in the T-type LC network as a shunt inductor to achieve low insertion loss on a loss-silicon substrate[4]; however, this method sacrifices DC power and linearity. The transmission line was replaced by π-type LC-network equivalents in Refs. [5, 6]. Low insertion loss was achieved by Si IPD technology[5] and superconductor technology[6], respectively. T-type LC-network equivalents have also been suggested to realize a lumped-element power divider using SI-GaAs-based IPD technology[7, 8]. A wide-band and miniature power divider was realized with GaAs technology[9], in which the transmission line was implemented by bridged T-coils.

Owing to low conductor and substrate loss, the high quality factor is one of the most attractive advantages in IPD. However, it increases the production and packaging costs for multichip connection. In contrast, passive devices can easily be integrated with other functional circuits in a single chip using ordinary semiconductor processes. However, the thinner conductor in an ordinary process has a large ohmic loss resulting in the lower quality factor[10]. The wide-band power divider using ordinary GaAs technology[9] exhibits higher insertion loss compared with relative reports[5, 7, 8] that use IPD technology. In this paper, the quality factor of the inductor is discussed and calculated for its impact on insertion loss. According to the discussion on the quality factor, it is possible to achieve low insertion loss with ordinary GaAs technology. As depicted in Section 2.2, a quality factor of more than 20 can provide available loss of less than 0.5 dB. The inductor physical dimensions are chosen and optimized to obtain an adequate quality factor and an appropriate size. Then, a power divider using ordinary GaAs technology is analyzed, designed and fabricated. The measured results show that the power divider with ordinary GaAs technology not only exhibits low insertion loss as small as IPD technology, but also provides smaller size and easiness to integrate in a system.

The conventional Wilkinson power divider is shown in Fig. 1. One-quarter wavelength transmission line with characteristic impedance 2Z0 and ballast resistor with impedance 2Z0 are the fundamental elements of the Wilkinson power divider, where Z0 is the terminal impedance. The transmission line can be equivalent to the π-type LC network, as shown in Fig. 2. Then, the lumped Wilkinson power divider can be realized by replacing the transmission line with a π-type LC network, as shown in Fig. 3.

Figure  1.  Wilkinson power divider.
Figure  2.  Transmission line and its LC network counterpart.
Figure  3.  Lumped Wilkinson power divider.

The ABCD matrix of transmission line with characteristic impedance ZC and length in Fig. 2 can be expressed as:

[ABCD]TL=[cosβjZCsinβjYCsinβcosβ].

(1)

In Eq. (1), YC is the characteristic admittance, β is the propagation constant and β is the electric length of the transmission line. β=90 when the transmission line is one-quarter wavelength, in which the corresponding frequency is ω0.

The ABCD matrix of the π-type LC network in Fig. 2 is as follows:

[ABCD]LC=[1ω2LCjωLj2ωCjω3LC21ω2LC].

(2)

In Eq. (2), L is the inductance of the series inductor and C is the capacitance of the shunt capacitor in the LC network. When β=90 and [ABCD]TL=[ABCD]LC, the following equations can be achieved: ω0=1LC and ZC=LC, where ω0 is the center frequency and is one-quarter wavelength at frequency ω0.

Table 1 shows the characteristics of different technologies. In this design, the ordinary GaAs technology is chosen for integrated lumped power divider design. As shown in Table 1, the ordinary GaAs technology has a thinner conductor thickness so that the quality factor is smaller than in special IPD technology. The limited quality factor of the inductor has to be considered, especially for insertion-loss sensitive devices, such as power dividers.

Table  1.  Characteristics of different technologies.
DownLoad: CSV  | Show Table

A non-ideal chip inductor can be simplified as an inductor parallel with a resistor Rp, as shown in Fig. 3. Then, the insertion loss can be calculated from the ABCD matrix. The Π-type LC network is used for 50 to 100 Ω transformation, which is complex for insertion loss calculation. Two π-type LC networks are connected with the same terminal impedance Z0= 50 Ω, as shown in Fig. 4. The insertion loss of the power divider can easily be calculated from dual-π-type LC networks.

Figure  4.  Dual-π-type LC network.

The parasitic resistance Rp can be simply obtained from quality factor Q and inductance L, i.e., Rp=ωLQ. The ABCD matrix of the π-type LC network considering Rp can be given as:

[ABCD]1=[1ω2LCRpjωL+RpjωLRpjωL+Rpj2ωCjω3C2LRpjωL+Rp1ω2LCRpjωL+Rp].

(3)

The insertion loss ILπ can be obtained from the elements of matrix [ABCD]1:

ILπ={2/[A2+BC+(AB+BD)/2Z0+2Z0(AC+DC)+BC+D2]}1/2.

(4)

Then, the insertion loss IL of the power divider can be given as: IL = ILπ. The relationship between the insertion loss and the quality factor can be achieved when f0 is fixed. As shown in Fig. 5, the insertion loss varies with the frequency for different quality factors. In this design, the center frequency is set at 5.85 GHz. The insertion loss is less than 0.5 dB when Q 20, as shown in Fig. 5. The minimum quality factor Qmin = 20 in the operation frequency range can be obtained by the dimension being optimized in ordinary GaAs technology. The electromagnetic (EM) simulator Agilent Momentum is used for EM simulation and optimization. The parameters of the two-turn rotund inductor in the power divider are optimized as follows: width = 20 μm, diameter = 170 μm and space = 10 μm. The simulated average quality factor is bigger than 23 from 5 to 7 GHz, which can guarantee an available insertion loss.

Figure  5.  Insertion loss with different quality factors.

The power divider is fabricated using Win 0.5 μm pHEMT technology. Printed-circuit board Rogers 4003 with relative permittivity of 3.55, loss tangent of 0.002 and thickness of 0.508 mm was applied as a test board to measure the performance of the fabricated GaAs power divider, as shown in Fig. 6. The chip photo of the circuit with an area of 0.9 × 0.85 mm2 is shown in Fig. 7. The measured results and simulated results are depicted in Fig. 8. The microstrip and coaxial RF connector loss have been deducted from the measured results. As shown in Fig. 8, the measured return loss and isolation are better than 15 dB and 20 dB at the operation bandwidth of 5.15 to 6.15 GHz, respectively. The power divider features an average insertion loss of 0.5 dB and a minimum insertion loss of 0.42 dB at 5.5 GHz after deducting PCB influence. Table 2 shows the performance of the power divider fabricated using ordinary GaAs technology in this paper compared with some previous works. The measured results show excellent RF performances with low cost and compact size.

Figure  6.  Testing PCB of power divider.
Figure  7.  Chip photo of power divider.
Figure  8.  Measured (dashed line) and simulated (solid line) results. (a) S11. (b) Insertion loss. (c) Isolation.
Table  2.  Comparison with previously reported high-performance power divider.
DownLoad: CSV  | Show Table

A compact IPD power divider with low insertion loss was constructed with ordinary GaAs technology. The non ideal chip inductor was analyzed for its impact on insertion loss. Results indicate that the integrated lumped power divider is appropriate for the system in package (SiP) or multi-chip module applications.



[1]
Grebennikov A. RF and microwave transmitter design. New York: Wiley, 2011 http://ci.nii.ac.jp/ncid/BB06505372
[2]
Pozar D M. Microwave engineering. 3rd ed. New York: Wiley, 2005 https://www.researchgate.net/publication/308449120_Microwave_Engineering
[3]
Kawai T, Ohta I, Enokihara A. Design method of lumped-element dual-band Wilkinson power dividers based on frequency transformation. Asia-Pacific Microwave Conference Proceedings, 2010:710 http://ieeexplore.ieee.org/document/5728440/
[4]
Lu L H, Liao Y T, Wu C R. A miniaturized Wilkinson power divider with CMOS active inductors. IEEE Microw Wireless Compon Lett, 2005, 15(11):775 doi: 10.1109/LMWC.2005.859020
[5]
Kim H T, Liu K, Frye R C, et al. Design of compact power divider using integrated passive device (IPD) technology. Electronic Components and Technology Conference, 2009:1894 http://ieeexplore.ieee.org/xpls/icp.jsp?arnumber=5074278
[6]
Elsbury M M, Dresselhaus P D, Bergren N F, et al. Broadband lumped-element integrated n-way power dividers for voltage standards. IEEE Trans Microw Theory Tech, 2009, 57(8):2055 doi: 10.1109/TMTT.2009.2025464
[7]
Wang C, Qian C, Kyung G I, et al. High performance integrated passive technology by SI-GaAs-based fabrication for RF and microwave application. Asia-Pacific Microwave Conference Proceedings, 2008:1 http://ieeexplore.ieee.org/xpls/icp.jsp?arnumber=4958020
[8]
Wang C, Lee W S, Zhang F, et al. A novel method for the fabrication of integrated passive devices on SI-GaAs substrate. International Journal of Advanced Manufacturing Technology, 2011, 52:1011 doi: 10.1007/s00170-010-2807-z
[9]
Lin Y S, Lee J H. Miniature ultra-wideband power divider using bridged T-coils. IEEE Microw Compon Lett, 2012, 22(8):391 doi: 10.1109/LMWC.2012.2205231
[10]
Wu Rui, Liao Xiaoping, Zhang Zhiqiang. MMIC-based RF on-chip LC passive filters. Journal of Semiconductors, 2008, 29(12):2437 http://www.jos.ac.cn/bdtxbcn/ch/reader/view_abstract.aspx?file_no=08041402&flag=1
Fig. 1.  Wilkinson power divider.

Fig. 2.  Transmission line and its LC network counterpart.

Fig. 3.  Lumped Wilkinson power divider.

Fig. 4.  Dual-π-type LC network.

Fig. 5.  Insertion loss with different quality factors.

Fig. 6.  Testing PCB of power divider.

Fig. 7.  Chip photo of power divider.

Fig. 8.  Measured (dashed line) and simulated (solid line) results. (a) S11. (b) Insertion loss. (c) Isolation.

Table 1.   Characteristics of different technologies.

Table 2.   Comparison with previously reported high-performance power divider.

[1]
Grebennikov A. RF and microwave transmitter design. New York: Wiley, 2011 http://ci.nii.ac.jp/ncid/BB06505372
[2]
Pozar D M. Microwave engineering. 3rd ed. New York: Wiley, 2005 https://www.researchgate.net/publication/308449120_Microwave_Engineering
[3]
Kawai T, Ohta I, Enokihara A. Design method of lumped-element dual-band Wilkinson power dividers based on frequency transformation. Asia-Pacific Microwave Conference Proceedings, 2010:710 http://ieeexplore.ieee.org/document/5728440/
[4]
Lu L H, Liao Y T, Wu C R. A miniaturized Wilkinson power divider with CMOS active inductors. IEEE Microw Wireless Compon Lett, 2005, 15(11):775 doi: 10.1109/LMWC.2005.859020
[5]
Kim H T, Liu K, Frye R C, et al. Design of compact power divider using integrated passive device (IPD) technology. Electronic Components and Technology Conference, 2009:1894 http://ieeexplore.ieee.org/xpls/icp.jsp?arnumber=5074278
[6]
Elsbury M M, Dresselhaus P D, Bergren N F, et al. Broadband lumped-element integrated n-way power dividers for voltage standards. IEEE Trans Microw Theory Tech, 2009, 57(8):2055 doi: 10.1109/TMTT.2009.2025464
[7]
Wang C, Qian C, Kyung G I, et al. High performance integrated passive technology by SI-GaAs-based fabrication for RF and microwave application. Asia-Pacific Microwave Conference Proceedings, 2008:1 http://ieeexplore.ieee.org/xpls/icp.jsp?arnumber=4958020
[8]
Wang C, Lee W S, Zhang F, et al. A novel method for the fabrication of integrated passive devices on SI-GaAs substrate. International Journal of Advanced Manufacturing Technology, 2011, 52:1011 doi: 10.1007/s00170-010-2807-z
[9]
Lin Y S, Lee J H. Miniature ultra-wideband power divider using bridged T-coils. IEEE Microw Compon Lett, 2012, 22(8):391 doi: 10.1109/LMWC.2012.2205231
[10]
Wu Rui, Liao Xiaoping, Zhang Zhiqiang. MMIC-based RF on-chip LC passive filters. Journal of Semiconductors, 2008, 29(12):2437 http://www.jos.ac.cn/bdtxbcn/ch/reader/view_abstract.aspx?file_no=08041402&flag=1
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    Zebao Du, Hao Yang, Haiying Zhang, Min Zhu. An integrated power divider implemented in GaAs technology[J]. Journal of Semiconductors, 2014, 35(4): 045003. doi: 10.1088/1674-4926/35/4/045003
    Z B Du, H Yang, H Y Zhang, M Zhu. An integrated power divider implemented in GaAs technology[J]. J. Semicond., 2014, 35(4): 045003. doi: 10.1088/1674-4926/35/4/045003.
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    Received: 17 June 2013 Revised: 24 November 2013 Online: Published: 01 April 2014

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      Zebao Du, Hao Yang, Haiying Zhang, Min Zhu. An integrated power divider implemented in GaAs technology[J]. Journal of Semiconductors, 2014, 35(4): 045003. doi: 10.1088/1674-4926/35/4/045003 ****Z B Du, H Yang, H Y Zhang, M Zhu. An integrated power divider implemented in GaAs technology[J]. J. Semicond., 2014, 35(4): 045003. doi: 10.1088/1674-4926/35/4/045003.
      Citation:
      Zebao Du, Hao Yang, Haiying Zhang, Min Zhu. An integrated power divider implemented in GaAs technology[J]. Journal of Semiconductors, 2014, 35(4): 045003. doi: 10.1088/1674-4926/35/4/045003 ****
      Z B Du, H Yang, H Y Zhang, M Zhu. An integrated power divider implemented in GaAs technology[J]. J. Semicond., 2014, 35(4): 045003. doi: 10.1088/1674-4926/35/4/045003.

      An integrated power divider implemented in GaAs technology

      DOI: 10.1088/1674-4926/35/4/045003
      Funds:

      Project supported by the National Science and Technology Major Projects of China (Nos. 2011ZX03004-001-02, 2010ZX03007-002-03)

      the National Science and Technology Major Projects of China 2010ZX03007-002-03

      the National Science and Technology Major Projects of China 2011ZX03004-001-02

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      • Corresponding author: Du Zebao, Email:duzebao@ime.ac.cn
      • Received Date: 2013-06-17
      • Revised Date: 2013-11-24
      • Published Date: 2014-04-01

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