Chin. J. Semicond. > 2004, Volume 25 > Issue 3 > 284-287
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氮对重掺锑直拉硅中氧沉淀的影响

余学功 , 张媛 , 马向阳 and 杨德仁

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Key words: 直拉硅, 重掺锑, 氧沉淀

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    Received: 19 August 2015 Revised: Online: Published: 01 March 2004

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      Article Navigation >  Journal of Semiconductors  > 2004  >  25(3): 284-287
      余学功, 张媛, 马向阳, 杨德仁. 氮对重掺锑直拉硅中氧沉淀的影响[J]. 半导体学报(英文版), 2004, 25(3): 284-287.
      Citation:
      余学功, 张媛, 马向阳, 杨德仁. 氮对重掺锑直拉硅中氧沉淀的影响[J]. 半导体学报(英文版), 2004, 25(3): 284-287.
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      • Received Date: 2015-08-19

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