Chin. J. Semicond. > 2004, Volume 25 > Issue 3 > 288-291
|

CONTENTS

多孔硅衬底微波CVD金刚石薄膜的制备及其场电子发射

陈光华 , 蔡让岐 , 宋雪梅 and 贺德衍

+ Author Affiliations

PDF

Key words: 多孔硅, 金刚石薄膜, 场电子发射

    • Search

    Advanced Search >>

    GET CITATION

    shu

    Export: BibTex EndNote

    Article Metrics

    Article views: 2384 Times PDF downloads: 746 Times Cited by: 0 Times

    History

    Received: 19 August 2015 Revised: Online: Published: 01 March 2004

    Catalog

      Email This Article

      User name:
      Email:*请输入正确邮箱
      Code:*验证码错误
      Send
      Article Navigation >  Journal of Semiconductors  > 2004  >  25(3): 288-291
      陈光华, 蔡让岐, 宋雪梅, 贺德衍. 多孔硅衬底微波CVD金刚石薄膜的制备及其场电子发射[J]. 半导体学报(英文版), 2004, 25(3): 288-291.
      Citation:
      陈光华, 蔡让岐, 宋雪梅, 贺德衍. 多孔硅衬底微波CVD金刚石薄膜的制备及其场电子发射[J]. 半导体学报(英文版), 2004, 25(3): 288-291.
      shu

      • Received Date: 2015-08-19

      Catalog

        Journal of Semiconductors © 2017 All Rights Reserved   京ICP备05085259号-2

        /

        DownLoad:  Full-Size Img  PowerPoint
        Return
        Return