Chin. J. Semicond. > 2004, Volume 25 > Issue 3 > 288-291
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多孔硅衬底微波CVD金刚石薄膜的制备及其场电子发射

陈光华 , 蔡让岐 , 宋雪梅 and 贺德衍

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Key words: 多孔硅, 金刚石薄膜, 场电子发射

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    Received: 19 August 2015 Revised: Online: Published: 01 March 2004

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      Article Navigation >  Journal of Semiconductors  > 2004  >  25(3): 288-291
      陈光华, 蔡让岐, 宋雪梅, 贺德衍. 多孔硅衬底微波CVD金刚石薄膜的制备及其场电子发射[J]. 半导体学报(英文版), 2004, 25(3): 288-291.
      Citation:
      陈光华, 蔡让岐, 宋雪梅, 贺德衍. 多孔硅衬底微波CVD金刚石薄膜的制备及其场电子发射[J]. 半导体学报(英文版), 2004, 25(3): 288-291.
      shu

      • Received Date: 2015-08-19

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