Chin. J. Semicond. > 1988, Volume 9 > Issue 3 > 278-282
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用真空紫外光直接光CVD法进行a-Si膜的快速生长

杜开瑛

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    Received: 19 August 2015 Revised: Online: Published: 01 March 1988

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      Article Navigation >  Journal of Semiconductors  > 1988  >  9(3): 278-282
      杜开瑛. 用真空紫外光直接光CVD法进行a-Si膜的快速生长[J]. 半导体学报(英文版), 1988, 9(3): 278-282.
      Citation:
      杜开瑛. 用真空紫外光直接光CVD法进行a-Si膜的快速生长[J]. 半导体学报(英文版), 1988, 9(3): 278-282.
      shu

      • Received Date: 2015-08-19

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