Chin. J. Semicond. > 2004, Volume 25 > Issue 3 > 351-357
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成品率驱动下基于模型的掩模版优化算法

王旸 , 蔡懿慈 , 石蕊 and 洪先龙

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Key words: 掩模, 光刻, 基于模型的光学邻近矫正

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    Received: 19 August 2015 Revised: Online: Published: 01 March 2004

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      Article Navigation >  Journal of Semiconductors  > 2004  >  25(3): 351-357
      王旸, 蔡懿慈, 石蕊, 洪先龙. 成品率驱动下基于模型的掩模版优化算法[J]. 半导体学报(英文版), 2004, 25(3): 351-357.
      Citation:
      王旸, 蔡懿慈, 石蕊, 洪先龙. 成品率驱动下基于模型的掩模版优化算法[J]. 半导体学报(英文版), 2004, 25(3): 351-357.
      shu

      • Received Date: 2015-08-19

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