Chin. J. Semicond. > 2004, Volume 25 > Issue 12 > 1717-1721
|

CONTENTS

恒压应力下超薄Si_3N_4/SiO_2叠层栅介质与SiO_2栅介质寿命比较

林钢 and 徐秋霞

+ Author Affiliations

PDF

Key words: 恒压应力, 超薄Si3N4/SiO2叠层栅介质, 超薄SiO2栅介质, 栅介质寿命预测

    • Search

    Advanced Search >>

    GET CITATION

    shu

    Export: BibTex EndNote

    Article Metrics

    Article views: 2367 Times PDF downloads: 1226 Times Cited by: 0 Times

    History

    Received: 19 August 2015 Revised: Online: Published: 01 December 2004

    Catalog

      Email This Article

      User name:
      Email:*请输入正确邮箱
      Code:*验证码错误
      Send
      Article Navigation >  Journal of Semiconductors  > 2004  >  25(12): 1717-1721
      林钢, 徐秋霞. 恒压应力下超薄Si_3N_4/SiO_2叠层栅介质与SiO_2栅介质寿命比较[J]. 半导体学报(英文版), 2004, 25(12): 1717-1721.
      Citation:
      林钢, 徐秋霞. 恒压应力下超薄Si_3N_4/SiO_2叠层栅介质与SiO_2栅介质寿命比较[J]. 半导体学报(英文版), 2004, 25(12): 1717-1721.
      shu

      • Received Date: 2015-08-19

      Catalog

        Journal of Semiconductors © 2017 All Rights Reserved   京ICP备05085259号-2

        /

        DownLoad:  Full-Size Img  PowerPoint
        Return
        Return