Chin. J. Semicond. > 2004, Volume 25 > Issue 12 > 1722-1725
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纳米级精细线条图形的微细加工

任黎明 , 王文平 , 陈宝钦 , 周毅 , 黄如 and 张兴

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Key words: 微细加工, 电子束光刻, 邻近效应校正, ICP刻蚀

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    Received: 19 August 2015 Revised: Online: Published: 01 December 2004

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      Article Navigation >  Journal of Semiconductors  > 2004  >  25(12): 1722-1725
      任黎明, 王文平, 陈宝钦, 周毅, 黄如, 张兴. 纳米级精细线条图形的微细加工[J]. 半导体学报(英文版), 2004, 25(12): 1722-1725.
      Citation:
      任黎明, 王文平, 陈宝钦, 周毅, 黄如, 张兴. 纳米级精细线条图形的微细加工[J]. 半导体学报(英文版), 2004, 25(12): 1722-1725.
      shu

      • Received Date: 2015-08-19

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