Chin. J. Semicond. > 2002, Volume 23 > Issue 10 > 1046-1050
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SiO_2/Ta界面反应及其对铜扩散的影响(英文)

龙世兵 , 马纪东 , 于广华 , 赵洪辰 , 朱逢吾 , 张国海 and 夏洋

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Key words: ULSI铜互连, 扩散阻挡层, 界面反应, X射线光电子能谱

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    Received: 19 August 2015 Revised: Online: Published: 01 October 2002

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      Article Navigation >  Journal of Semiconductors  > 2002  >  23(10): 1046-1050
      龙世兵, 马纪东, 于广华, 赵洪辰, 朱逢吾, 张国海, 夏洋. SiO_2/Ta界面反应及其对铜扩散的影响(英文)[J]. 半导体学报(英文版), 2002, 23(10): 1046-1050.
      Citation:
      龙世兵, 马纪东, 于广华, 赵洪辰, 朱逢吾, 张国海, 夏洋. SiO_2/Ta界面反应及其对铜扩散的影响(英文)[J]. 半导体学报(英文版), 2002, 23(10): 1046-1050.
      shu

      • Received Date: 2015-08-19

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