Chin. J. Semicond. > 1998, Volume 19 > Issue 3 > 221-225
|

CONTENTS

CoSi_2超薄外延膜的生长研究

姚振钰 , 张国炳 , 秦复光 , 刘志凯 , 张建辉 and 林兰英

+ Author Affiliations

PDF

    • Search

    Advanced Search >>

    GET CITATION

    shu

    Export: BibTex EndNote

    Article Metrics

    Article views: 2347 Times PDF downloads: 1250 Times Cited by: 0 Times

    History

    Received: 20 August 2015 Revised: Online: Published: 01 March 1998

    Catalog

      Email This Article

      User name:
      Email:*请输入正确邮箱
      Code:*验证码错误
      Send
      Article Navigation >  Journal of Semiconductors  > 1998  >  19(3): 221-225
      姚振钰, 张国炳, 秦复光, 刘志凯, 张建辉, 林兰英. CoSi_2超薄外延膜的生长研究[J]. 半导体学报(英文版), 1998, 19(3): 221-225.
      Citation:
      姚振钰, 张国炳, 秦复光, 刘志凯, 张建辉, 林兰英. CoSi_2超薄外延膜的生长研究[J]. 半导体学报(英文版), 1998, 19(3): 221-225.
      shu

      • Received Date: 2015-08-20

      Catalog

        Journal of Semiconductors © 2017 All Rights Reserved   京ICP备05085259号-2

        /

        DownLoad:  Full-Size Img  PowerPoint
        Return
        Return