Chin. J. Semicond. > 2007, Volume 28 > Issue 12 > 1860-1863

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In0.53Ga0.47As/In0.52Al0.48As HEMTs with fmax of 183GHz

Liu Liang, Zhang Haiying, Yin Junjian, Li Xiao, Yang Hao, Xu Jingbo, Song Yuzhu, Zhang Jian, Niu Jiebin and Liu Xunchun

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Abstract: By epitaxial layer structure design and key fabrication process optimization,a lattice-matched InP-based In0.53Ga0.47As-In0.52Al0.48As HEMT with an ultra high maximum oscillation frequency (fmax) of 183GHz was fabricated.Thefmax is the highest value for HEMTs in China.Also,the devices are reported,including the device structure,the fabrication process,and the DC and RF performances.

Key words: maximum oscillation frequency/power-gain cutoff frequencyhigh electron mobility transistorInGaAs/InAlAs InP

1

Analysis of charge density and Fermi level of AlInSb/InSb single-gate high electron mobility transistor

S. Theodore Chandra, N. B. Balamurugan, M. Bhuvaneswari, N. Anbuselvan, N. Mohankumar, et al.

Journal of Semiconductors, 2015, 36(6): 064003. doi: 10.1088/1674-4926/36/6/064003

2

An 88 nm gate-length In0.53Ga0.47As/In0.52Al0.48As InP-based HEMT with fmax of 201 GHz

Zhong Yinghui, Wang Xiantai, Su Yongbo, Cao Yuxiong, Jin Zhi, et al.

Journal of Semiconductors, 2012, 33(7): 074004. doi: 10.1088/1674-4926/33/7/074004

3

An InP-based heterodimensional Schottky diode for terahertz detection

Wen Ruming, Sun Hao, Teng Teng, Li Lingyun, Sun Xiaowei, et al.

Journal of Semiconductors, 2012, 33(10): 104001. doi: 10.1088/1674-4926/33/10/104001

4

High breakdown voltage InGaAs/InP double heterojunction bipolar transistors with fmax = 256 GHz and BVCEO = 8.3 V

Cheng Wei, Zhao Yan, Gao Hanchao, Chen Chen, Yang Naibin, et al.

Journal of Semiconductors, 2012, 33(1): 014004. doi: 10.1088/1674-4926/33/1/014004

5

Ultra high-speed InP/InGaAs SHBTs with ft and fmax of 185 GHz

Zhou Lei, Jin Zhi, Su Yongbo, Wang Xiantai, Chang Hudong, et al.

Journal of Semiconductors, 2010, 31(9): 094007. doi: 10.1088/1674-4926/31/9/094007

6

Fabrication of a 120 nm gate-length lattice-matched InGaAs/InAlAsInP-based HEMT

Huang Jie, Guo Tianyi, Zhang Haiying, Xu Jingbo, Fu Xiaojun, et al.

Journal of Semiconductors, 2010, 31(9): 094008. doi: 10.1088/1674-4926/31/9/094008

7

Ultra High-Speed InP/InGaAs SHBTs with ft of 210GHz

Cheng Wei, Jin Zhi, Liu Xinyu, Yu Jinyong, Xu Anhuai, et al.

Journal of Semiconductors, 2008, 29(3): 414-417.

8

A Submicron InGaAs/InP Heterojunction Bipolar Transistor with ft of 238GHz

Jin Zhi, Cheng Wei, Liu Xinyu, Xu Anhuai, Qi Ming, et al.

Journal of Semiconductors, 2008, 29(10): 1898-1901.

9

Fabrication of a High-Performance RTD on InP Substrate

Qi Haitao, Feng Zhen, Li Yali, Zhang Xiongwen, Shang Yaohui, et al.

Chinese Journal of Semiconductors , 2007, 28(12): 1945-1948.

10

Agilent HBT Model Parameters Extraction Procedure For InP HBT’

He Jia, Sun Lingling, Liu Jun

Chinese Journal of Semiconductors , 2007, 28(S1): 443-447.

11

Surface Damage and Removal of Ar+ Etched InGaAs,n-InP and p-InP

Lü Yanqiu, Yue Fangyu, Hong Xuekun, Chen Jiangfeng, Han Bing, et al.

Chinese Journal of Semiconductors , 2007, 28(1): 122-126.

12

Growth and characterization of InP-based and phosphorous-involved materials for applications to HBTs by GSMBE were studied systematically. High quality 50ram InP-based HBT and 100mm InGaP/GaAs HBT epitaxial materials were obtained through optimizing the HBT structure design and the GSMBE growth condition. It is shown that the HBT devices and circuits with high performance can be achieved by using the epi-wafers grown by the GSMBE technology developed in this work.

Qi Ming, Xu Anhuai, Ai Likun, Sun Hao, Zhu Fuying, et al.

Chinese Journal of Semiconductors , 2007, 28(S1): 182-185.

13

A New Method for InGaAs/InP Composite ChannelHEMTs Simulation

Liu Liang, Zhang Haiying, Yin Junjian, Li Xiao, Xu Jingbo, et al.

Chinese Journal of Semiconductors , 2007, 28(11): 1706-1711.

14

InP/InGaAs Heterojunction Bipolar Transistor with Base μ-Bridge and Emitter Air-Bridge

Yu Jinyong, Liu Xinyu, Su Shubing, Wang Runmei, Xu Anhuai, et al.

Chinese Journal of Semiconductors , 2007, 28(2): 154-158.

15

Growth Modes of InP Epilayers Grown by Solid Source Molecular Beam Epitaxy

Pi Biao, Shu Yongchun, Lin Yaowang, Xu Bo, Yao Jianghong, et al.

Chinese Journal of Semiconductors , 2007, 28(S1): 28-32.

16

Semi-Insulating Long InP Single Crystal Growth

Sun Niefeng, Mao Luhong, Guo Weilian, Zhou Xiaolong, Yang Ruixia, et al.

Chinese Journal of Semiconductors , 2007, 28(S1): 186-189.

17

Ultrahigh-Speed Lattice-Matched In0.53Ga0.47As/In0.52Al0.48A HEMTs with 218GHz Cutoff Frequency

Liu Liang, Zhang Haiying, Yin Junjian, Li Xiao, Xu Jingbo, et al.

Chinese Journal of Semiconductors , 2007, 28(12): 1864-1867.

18

Activation of Fe Doping and Electrical Compensation in Semi-Insulating InP

Miao Shanshan, Zhao Youwen, Dong Zhiyuan, Deng Aihong, Yang Jun, et al.

Chinese Journal of Semiconductors , 2006, 27(11): 1934-1939.

19

Synthesis and Spectral Properties of InP Colloidal Quantum Dots

Zhang Daoli, Zhang Jianbing, Wu Qiming, Yuan Lin, Chen Sheng, et al.

Chinese Journal of Semiconductors , 2006, 27(7): 1213-1216.

20

Design and Process for Self-Aligned InP/InGaAs SHBT Structure

Li Xianjie, Cai Daomin, Zhao Yonglin, Wang Quanshu, Zhou Zhou, et al.

Chinese Journal of Semiconductors , 2005, 26(S1): 136-139.

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    Liu Liang, Zhang Haiying, Yin Junjian, Li Xiao, Yang Hao, Xu Jingbo, Song Yuzhu, Zhang Jian, Niu Jiebin, Liu Xunchun. In0.53Ga0.47As/In0.52Al0.48As HEMTs with fmax of 183GHz[J]. Journal of Semiconductors, 2007, 28(12): 1860-1863.
    Liu L, Zhang H Y, Yin J J, Li X, Yang H, Xu J B, Song Y Z, Zhang J, Niu J B, Liu X C. In0.53Ga0.47As/In0.52Al0.48As HEMTs with fmax of 183GHz[J]. Chin. J. Semicond., 2007, 28(12): 1860.
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    Received: 18 August 2015 Revised: 12 June 2007 Online: Published: 01 December 2007

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      Liu Liang, Zhang Haiying, Yin Junjian, Li Xiao, Yang Hao, Xu Jingbo, Song Yuzhu, Zhang Jian, Niu Jiebin, Liu Xunchun. In0.53Ga0.47As/In0.52Al0.48As HEMTs with fmax of 183GHz[J]. Journal of Semiconductors, 2007, 28(12): 1860-1863. ****Liu L, Zhang H Y, Yin J J, Li X, Yang H, Xu J B, Song Y Z, Zhang J, Niu J B, Liu X C. In0.53Ga0.47As/In0.52Al0.48As HEMTs with fmax of 183GHz[J]. Chin. J. Semicond., 2007, 28(12): 1860.
      Citation:
      Liu Liang, Zhang Haiying, Yin Junjian, Li Xiao, Yang Hao, Xu Jingbo, Song Yuzhu, Zhang Jian, Niu Jiebin, Liu Xunchun. In0.53Ga0.47As/In0.52Al0.48As HEMTs with fmax of 183GHz[J]. Journal of Semiconductors, 2007, 28(12): 1860-1863. ****
      Liu L, Zhang H Y, Yin J J, Li X, Yang H, Xu J B, Song Y Z, Zhang J, Niu J B, Liu X C. In0.53Ga0.47As/In0.52Al0.48As HEMTs with fmax of 183GHz[J]. Chin. J. Semicond., 2007, 28(12): 1860.

      In0.53Ga0.47As/In0.52Al0.48As HEMTs with fmax of 183GHz

      • Received Date: 2015-08-18
      • Accepted Date: 2007-06-12
      • Revised Date: 2007-06-12
      • Published Date: 2007-11-28

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